Paresh Mathur

Lead a portfolio of 10+ lithography application products across diagnostics, on-scanner optimization, and computational patterning and diagnostics.

• Lead a portfolio of 10+ lithography application products across diagnostics, on-scanner optimization, and computational patterning and diagnostics, spanning 4 teams and approximately 35 engineers and specialists.
• Served as acting Chief Product Owner for the Wafermap Modeling Train, assuming ownership of business-line application products during an interim leadership assignment and continuing in the role after the procedural gap.
• Drive portfolio planning across long-range capacity, staffing priorities, budget-level tradeoffs, and cross-team dependency resolution.
• Align Release Train Engineers, Group Leads, product management, marketing, customer support, and other stakeholders around execution priorities and portfolio goals.
• Advanced a portfolio strategy centered on reusable foundation models, improving consistency, scalability, and long-term maintainability across products.

Defined and launched 2 product suites and continue to lead a third, centered on model-based wafer-topography optimization.

• Own backlog prioritization, roadmap input, requirements, user stories, acceptance criteria, and delivery for image-optimization products used by focus application customers.
• Partner with a 10-engineer team and stakeholders across marketing, UX/UI, customer support, product management, and project management to convert customer and business needs into deliverable product increments.
• Defined and launched 2 product suites and continue to lead a third, centered on model-based wafer-topography optimization for contamination detection, focus correction, and overlay correction.
• Bring structure to ambiguous technical problem spaces by working closely with software engineers and domain experts to turn advanced modeling capabilities into usable product value.
• Enabled customers to improve yield and reduce rework on critical layers by translating complex technical solutions into practical, outcome-oriented products.

Led a big-data optimization initiative on an EUV source, engineering features from source data to optimize pre-pulse versus main-pulse timing.

• Worked in the Equipment Expert Team in ALEMP, MTC, focused on optical lithography and associated light sources in a semiconductor R&D environment.
• Contributed to EUV scanner and light source R&D across NXE3300 through NXE3400 platforms.
• Led a big-data optimization initiative on an EUV source, engineering features from source data to optimize pre-pulse versus main-pulse timing for improved plasma generation and EUV output from tin.
• Applied data-driven analysis in a physically complex system where pre-pulse conditioning, main-pulse CO2 absorption, and timing windows directly affected source performance.
• Supported broader analytics initiatives including machine learning analysis, predictive maintenance, root-cause investigation, statistical modeling, SPC rule generation, offline diagnostics tooling, and KPI development from scanner logs and defect maps.